【Device Papers】Effects of Epitaxial Layer Thickness on Heavy Ion-Induced Single-Event Burnout in Vertical β-Ga₂O₃ Schottky Barrier Diodes

      Researchers from the Vanderbilt University have published a dissertation titled "Effects of Epitaxial Layer Thickness on Heavy Ion-Induced Single-Event Burnout in Vertical β-Ga₂O₃ Schottky Barrier Diodes" in IEEE Transactions on Nuclear Science.

Abstract:

      Vertical beta-gallium oxide (β-Ga₂O₃) Schottky barrier diodes (SBDs) with field plates and edge termination structures are irradiated with heavy ions, O+, Ar+, and Pr+ having linear energy transfer (LET) of 5.5-46 MeV-cm2/mg and Californium-252 (Cf-252), which emits heavy ions and alpha particles. Devices that have the same structure and similar doping concentrations, but thicker (10 μm) epitaxial layers, show higher single event burnout (SEB) voltage thresholds than devices with thinner (4 μm) epitaxial layers. Ions that stop near the middle of the active region and those that pass through the entire region each cause catastrophic failure in these devices, in contrast to previous results on silicon carbide SBDs with similar epitaxial layer thicknesses. Cf-252 provides a low-LET, quick screening source for space applications of β-Ga₂O₃ SBDs. However, significantly lower SEB voltage thresholds are observed during higher-LET, longer range, Pr heavy-ion testing. The edge region is found to be most vulnerable to SEB for these β-Ga₂O₃ SBDs.

DOI：

https://doi.org/10.1109/TNS.2025.3576034